3D Surface Profiler

VK-D3

100 × 100 mm 3.94” × 3.94”

Approx. 19.5 kg

Keyence

VK-S3

70 × 70 mm 2.76” × 2.76”

Approx. 17 kg

Keyence

VK-D1

100 mm x 100 mm 3.94" x 3.94"

Approx. 18.5 kg

Keyence

VK-S1

70 mm x 70 mm 2.76" x 2.76"

Approx. 16.0 kg

Keyence

VK-X3000

Controller

42 to 28800×*1

11 to 7398 μm

Focus variation, Laser confocal, Spectral interference, White light interferometry

404 nmVK-X3050: Semiconductor laser, 661 nm, VK-X3100: Semiconductor laser

Line: 7900 Hz*2, Surface: 125 Hz

VK-X3050

Measurement head

42 to 28800×*1

11 to 7398 μm

Focus variation, Laser confocal, Spectral interference, White light interferometry

661 nm, Semiconductor laser

Line: 7900 Hz*2, Surface: 125 Hz

VK-X3100

Measurement head

42 to 28800×*1

11 to 7398 μm

Focus variation, Laser confocal, Spectral interference, White light interferometry

404 nm, Semiconductor laser

Line: 7900 Hz*2, Surface: 125 Hz

Keyence

Keyence

Keyence

Keyence

Keyence

Keyence

Keyence

Keyence

Keyence

VK-X100K

Controller

―

1x to 8x

100x to 8000x

Pinhole confocal optical system

0.005 µm, 0.02 µm *1, 7 mm 0.28"

VK-X105

Measurement unit

10x, 20x, 50x, 5x

101239.84, 135053.15, 202579.72, 2027.95, 2700106.30, 27010.63, 50619.92, 67526.57

0.540.02", 16.50.65", 22.50.89", 3.10.12"

0.13, 0.3, 0.46, 0.8

1x to 8x

VK-X110

Measurement unit

10×, 100×, 20×, 50×

101239.84, 135053.15, 2027.95, 27010.63, 50619.92, 67526.57, 1013.98, 1355.31

0.540.02", 16.50.65", 3.10.12", 0.30.01"

0.3, 0.46, 0.8, 0.95

1x to 8x

VK-X200K

Controller

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1x to 8x

200x to 24000x

Pinhole confocal optical system

7 mm 0.28", 0.0005 µm, 0.012 µm *1

VK-X210

Measurement unit

10×, 150×, 20×, 50×

101239.84, 135053.15, 2027.95, 27010.63, 50619.92, 67526.57, 672.64, 903.54

16.50.65", 3.10.12", 0.20.008", 0.350.01"

0.3, 0.46, 0.95

1x to 8x

VK-X1000

Controller

800 x*1, Up to 28

11 µm to 7, 398 µm

4 to 125 Hz, 7, 900 Hz*2

16-bit photomultiplier: High-definition color CMOS, Automatic upper/lower limit setting, Focus variation, high-speed light intensity optimization (AAGII), Pinhole confocal optical system, poor reflected light intensity supplement (Double Scan)

0.2 + L /100 µm or less (L = Measuring length)*3, 0.5 nm (VK-X1100), 000 steps, 10 x: 100 nm, 16 bits, 20 x: 40 nm, 20 x: 50 nm, 5 nm (VK-X1050), 5 x: 500 nm, 50 x: 12 nm (VK-X1100)20 x: 40 nm, 50 x: 20 nm (VK-X1050), 50 x: 20 nm (VK-X1100)5 x: 500 nm, 50 x: 30 nm (VK-X1050), 700

VK-X1050

Head unit

800 x*1, Up to 28

11 µm to 7, 398 µm

4 to 125 Hz, 7, 900 Hz*2

16-bit photomultiplier: High-definition color CMOS, Automatic upper/lower limit setting, Focus variation, high-speed light intensity optimization (AAGII), Pinhole confocal optical system, poor reflected light intensity supplement (Double Scan)

0.2 + L /100 µm or less (L = Measuring length)*3, 000 steps, 10 x: 100 nm, 16 bits, 20 x: 40 nm, 20 x: 50 nm, 5 nm, 5 x: 500 nm, 50 x: 20 nm, 50 x: 30 nm, 700

VK-X1100

Head unit

800 x*1, Up to 28

11 µm to 7, 398 µm

4 to 125 Hz, 7, 900 Hz*2

16-bit photomultiplier: High-definition color CMOS, Automatic upper/lower limit setting, Focus variation, high-speed light intensity optimization (AAGII), Pinhole confocal optical system, poor reflected light intensity supplement (Double Scan)

0.2 + L /100 µm or less (L = Measuring length)*3, 0.5 nm, 000 steps, 10 x: 100 nm, 16 bits, 20 x: 40 nm, 20 x: 50 nm, 5 x: 500 nm, 50 x: 12 nm, 50 x: 20 nm, 700

VK-X120K

Up to 19200×*1

16 µm to 5400 µm

4 to 120 Hz, 7900 Hz*2

16-bit photomultiplier, Automatic upper/lower limit setting, high-speed light intensity optimization (AAGII), Pinhole confocal optical system, poor reflected light intensity supplement (Double Scan)

0.2+L/100 µm or less (L=Measuring Length)*3, 1.4 million steps, 100× 20 nm *3, 16 bits, 20× 40 nm, 5 nm, 50× 20 nm

128 mm 5.039" (option), 28 mm 1.102", Base with separate measuring head

VK-X150K

Up to 19200×*1

16 µm to 5400 µm

4 to 120 Hz, 7900 Hz*2

16-bit photomultiplier, Automatic upper/lower limit setting, high-speed light intensity optimization (AAGII), Pinhole confocal optical system, poor reflected light intensity supplement (Double Scan)

0.2+L/100 µm or less (L=Measuring Length)*3, 1.4 million steps, 100× 20 nm *3, 16 bits, 20× 40 nm, 5 nm, 50× 20 nm

128 mm 5.039" (option), 28 mm 1.102", Base with separate measuring head

VK-X250K

Up to 28000×*1

11 µm to 5400 µm

4 to 120 Hz, 7900 Hz*2

16-bit photomultiplier, Automatic upper/lower limit setting, high-speed light intensity optimization (AAGII), Pinhole confocal optical system, poor reflected light intensity supplement (Double Scan)

0.2+L/100 µm or less (L=Measuring Length)*3, 0.5 nm, 14 million steps, 150× 12 nm *3, 16 bits, 20× 40 nm, 50× 12 nm

128 mm 5.039" (option), 28 mm 1.102", Base with separate measuring head

VK-X130K

Up to 19200×*1

16 µm to 5400 µm

4 to 120 Hz, 7900 Hz*2

16-bit photomultiplier, Automatic upper/lower limit setting, high-speed light intensity optimization (AAGII), Pinhole confocal optical system, poor reflected light intensity supplement (Double Scan)

0.2+L/100 µm or less (L=Measuring Length)*3, 1.4 million steps, 100× 20 nm *3, 16 bits, 20× 40 nm, 5 nm, 50× 20 nm

128 mm 5.039" (option), 28 mm 1.102", Base with separate measuring head

VK-X160K

Up to 19200×*1

16 µm to 5400 µm

4 to 120 Hz, 7900 Hz*2

16-bit photomultiplier, Automatic upper/lower limit setting, high-speed light intensity optimization (AAGII), Pinhole confocal optical system, poor reflected light intensity supplement (Double Scan)

0.2+L/100 µm or less (L=Measuring Length)*3, 1.4 million steps, 100× 20 nm *3, 16 bits, 20× 40 nm, 5 nm, 50× 20 nm

128 mm 5.039" (option), 28 mm 1.102", Base with separate measuring head

VK-X260K

Up to 28000×*1

11 µm to 5400 µm

4 to 120 Hz, 7900 Hz*2

16-bit photomultiplier, Automatic upper/lower limit setting, high-speed light intensity optimization (AAGII), Pinhole confocal optical system, poor reflected light intensity supplement (Double Scan)

0.2+L/100 µm or less (L=Measuring Length)*3, 0.5 nm, 14 million steps, 150× 12 nm *3, 16 bits, 20× 40 nm, 50× 12 nm

128 mm 5.039" (option), 28 mm 1.102", Base with separate measuring head